January 30, 2006

Governor, Majority Leader, Speaker Announce Opening Of $50M Sematech Lithography R&D Center At UAlbany

By: by Steve Janack, Director of Communications, Albany NanoTech


Governor George E. Pataki, Senate Majority Leader Joseph L. Bruno, and Assembly Speaker Sheldon Silver today announced the opening of the new SEMATECH Extreme Ultraviolet Lithography Resist Test Center (EUV-RTC), a one-of-a-kind research and development center designed to provide the global microchip industry with advanced technology solutions.

The new center builds on the partnership, originally announced by the Governor in July 2002, that SEMATECH selected New York for the location of its International SEMATECH North operations, and will complement the programs of the recently announced University at Albany Institute for Nanoelectronics Discovery and Exploration (INDEX).

“The opening of the new SEMATECH Extreme Ultraviolet Lithography Resist Test Center is further proof that our efforts to transform the Capital Region into a global leader of high-tech research and development are working,” Governor Pataki said. “New York’s Tech Valley attracts millions of dollars in new investment and has become the place where cutting-edge research and development happens, making New York State an international leader in high-tech, which will lead to the creation of new jobs and opportunities for New Yorkers well into the 21st century.”

Senate Majority Leader Joseph L. Bruno said, “Building a stronger economy and creating jobs in high technology doesn’t come from catching up with everyone else, it means staying one step ahead of the competition and taking the lead. The new SEMATECH EUV-RTC is another important high tech program that will keep the Capital Region, and all of New York State, on the cutting edge of high tech research and development.”

Assembly Speaker Sheldon Silver said, “This is good news for not only for the region, but also for the high-tech industry in the state. Initiatives such as the INVENT venture I announced last July and the other significant investments we have made in nano-technology are paying dividends that will ultimately benefit the New York State economy and create the kind of jobs that our state so desperately needs.”

The new SEMATECH Extreme Ultraviolet Lithography Resist Test Center is a state-of-the-art, one-of-a-kind facility with an operating budget of approximately $20 million through 2008 and houses more than $30 million in extreme ultraviolet exposure, test, support, and metrology tools. The Extreme Ultraviolet Lithography Resist Test Center will reduce the time it takes to develop new lithography processes for manufacturing by providing microchip manufacturers and suppliers with a central location to engage in early development of extreme ultraviolet lithography.

The center will identify, test, and qualify state-of-the-art extreme ultraviolet photoresists, which are photosensitive materials that allow the patterning of extremely small transistor patterns on both 200mm and 300mm wafers, making it possible to manufacture the ultra-high density, multi-functional, computer nanochips of the future.

Extreme ultraviolet lithography is a leading candidate for current and future semiconductor technology that can be used to print extremely fine circuit patterns and vast numbers of electrical devices onto semiconductors, resulting in microchips that can process immense amounts of data, which could possibly be used in applications like voice and image recognition systems, personal medical diagnostics, and intelligent robotics.

SEMATECH’s American, European, and Pacific Rim member companies, which include IBM, Intel, AMD, Infineon, Panasonic, Freescale, Philips, Hewlett-Packard, TSMC, Texas Instruments, Spansion, and Samsung, will be the first to locate researchers and engineers on site at the University at Albany College of Nanoscale Science and Engineering to take advantage of the new next-generation center.

In addition, equipment and material supplier technicians and engineers from AZ Electronic Materials, Dongjin, Fujifilm, JSR, Rohm & Haas, and TOK will also begin work at the facility.

SEMATECH President and Chief Executive Officer Michael R. Polcari said, “This test center will serve as a global support base for the semiconductor industry, and will allow SEMATECH to maintain our leadership in enabling infrastructure development for EUV. Industry suppliers will benefit by having early access to EUV exposures, which will accelerate their learning cycles for EUV resists. This capability in turn will enable SEMATECH members and the semiconductor industry to meet requirements for introducing EUV into manufacturing. The Extreme Ultraviolet Lithography Resist Test Center is a great example of the effectiveness of our strategic partnership with New York State and the University at Albany’s College of Nanoscale Science and Engineering in serving our customer base and the global semiconductor industry.”

SUNY Chancellor John Ryan said, “Today, SUNY and the University at Albany achieve yet another important milestone in becoming the nanoelectronics research and development center of the world. The SEMATECH announcement provides an added resource that allows one of our top research campuses to develop and deploy the disruptive innovations that will drive societal progress in the 21st century. We thank Governor Pataki for his support in transforming SUNY into a global science and technology leader.”

University at Albany President Kermit Hall said, “We are delighted with the Governor's announcement that SEMATECH will locate its next-generation state-of-the-art R&D center at the University at Albany. It will provide the state and the world with a unique and enabling array of research, development, and prototyping opportunities. We are extremely grateful to the State and SEMATECH for their unprecedented investment in our nanoscience and nanoengineering programs. These investments would not have been possible without the proactive leadership that Governor Pataki continues to provide in support of universities and high-tech industry in New York.”

Dr. Alain Kaloyeros, President of Albany NanoTech and Vice President and Chief Administrative Officer of the College of Nanoscale Science and Engineering (CNSE) of the University at Albany said, “We are thrilled that SEMATECH’s member companies, including its newest member, Samsung Electronics, are participating in this important new R&D center. The opening of the Extreme Ultraviolet Lithography Resist Test Center is a great testimony to the leading global role that SEMATECH is playing in advancing the semiconductor industry’s R&D roadmap. It is also another strong demonstration that the strategy of Governor Pataki is paying significant dividends for New York State.”

SEMATECH is a consortium of the world’s 12 major computer chip manufacturers and is a catalyst for accelerating the commercialization of technology innovations into manufacturing solutions. SEMATECH delivers significant leverage to its semiconductor and emerging technology partners by setting global direction, creating opportunities for flexible collaboration, and conducting strategic research and development.

International SEMATECH was initially established in 1987 to increase the United State's worldwide market share of the chip industry and has since expanded its mission to be the lead R&D organization for worldwide semiconductor manufacturers. International SEMATECH's goal is to improve semiconductor manufacturing technologies for computer efficiency, consumer products and military weapon systems.

SEMATECH consortia members include AMD, Freescale, Hewlett-Packard, IBM, Infineon, Intel, Panasonic, Philips, Samsung, Spansion, TSMC, and Texas Instruments.

The University at Albany College of Nanoscale Science and Engineering (CNSE) is home to the Albany Center of Excellence in Nanoelectronics (NYSCEN), a 450,000 square foot complex, which includes 200mm/300mm wafer facilities and nanoelectronics, system-on-a-chip technologies, biochips, optoelectronics and photonics devices, closed-loop sensors for monitoring, detection, and protection, and ultra-high-speed communication components.

With over 65,000 square feet of Class 1 capable 300 mm wafer cleanrooms, as well as on-site faculty and student researchers, CNSE provides corporate partners with a unique environment to create, develop, and test new nanoscience and nanoengineering innovations within a technically aggressive and financially competitive research and development environment. The University at Albany College of Nanoscale Science and Engineering partners with several resident partners including AMD, Applied Materials, ASML, Honeywell, IBM, Infineon, Micron Technologies, TEL, and SEMATECH. In addition, the College of Nanoscale Science and Engineering plays leadership roles in several R&D consortia including the MARCO Interconnect Focus Center funded by SIA, DARPA and the State of New York and the New York State Center for Advanced Interconnect Science and Technology, which is funded by SRC and New York State.